UV excimer laser assisted heteroepitaxy of (Si)GeSn on Si(100)

  1. Stefano Chiussi 3
  2. Stefan Stefanov 3
  3. Alessandro Benedetti 3
  4. Carmen Serra 3
  5. Dan Buca 2
  6. Jörg Schulze 1
  7. Pio González 3
  1. 1 Institut für Halbleitertechnick
  2. 2 Peter Grünberg Institute 9 and JARA
  3. 3 Universidade de Vigo
    info

    Universidade de Vigo

    Vigo, España

    ROR https://ror.org/05rdf8595

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Book:
SiGe and Ge: materials, processing, and devices
  1. D. Harane (dir. congr.)

Publisher: Electrochemical Society

ISBN: 978-1-62332-186-4

Year of publication: 2006

Pages: 115-125

Type: Book chapter

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