Oxidation processes in hydrogenated amorphous silicon nitride films deposited by ArF laser-induced CVD at low temperatures

  1. Banerji, N.
  2. Serra, J.
  3. González, P.
  4. Chiussi, S.
  5. Parada, E.
  6. León, B.
  7. Pérez-Amor, M.
Journal:
Thin Solid Films

ISSN: 0040-6090

Year of publication: 1998

Volume: 317

Issue: 1-2

Pages: 214-218

Type: Article

DOI: 10.1016/S0040-6090(97)00621-4 GOOGLE SCHOLAR
Data source: Scopus