Oxidation processes in hydrogenated amorphous silicon nitride films deposited by ArF laser-induced CVD at low temperatures
- Banerji, N.
- Serra, J.
- González, P.
- Chiussi, S.
- Parada, E.
- León, B.
- Pérez-Amor, M.
ISSN: 0040-6090
Année de publication: 1998
Volumen: 317
Número: 1-2
Pages: 214-218
Type: Article