Effects of r.f. power on optical and electrical properties of plasma-deposited hydrogenated amorphous silicon thin films

  1. Andújar, J.L.
  2. Kasaneva, J.
  3. Serra, J.
  4. Canillas, A.
  5. Roch, C.
  6. Morenza, J.L.
  7. Bertran, E.
Revue:
Sensors and Actuators: A. Physical

ISSN: 0924-4247

Année de publication: 1993

Volumen: 37-38

Número: C

Pages: 733-736

Type: Article

DOI: 10.1016/0924-4247(93)80124-Y GOOGLE SCHOLAR
La source de données: Scopus