GAS-MIXTURE DEPENDENCE OF THE LCVD OF SIO2-FILMS USING AN ARF LASER

  1. SZORENYI, T
  2. GONZALEZ, P
  3. FERNANDEZ, D
  4. POU, J
  5. LEON, B
  6. PEREZAMOR, M
Liburu bilduma:
SURFACE PROCESSING AND LASER ASSISTED CHEMISTRY
  1. BOYD, IW (coord.)
  2. FOGARASSY, E (coord.)
  3. STUKE, M (coord.)

ISBN: 0-444-88947-7

Argitalpen urtea: 1990

Alea: 18

Orrialdeak: 206-209

Biltzarra: SYMP AT THE 1990 SPRING CONF OF THE EUROPEAN MATERIALS RESEARCH SOC : SURFACE PROCESSING AND LASER ASSISTED CHEMISTRY

Mota: Biltzar ekarpena

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Datuen iturria: WoS