GAS-MIXTURE DEPENDENCE OF THE LCVD OF SIO2-FILMS USING AN ARF LASER
- SZORENYI, T
- GONZALEZ, P
- FERNANDEZ, D
- POU, J
- LEON, B
- PEREZAMOR, M
- BOYD, IW (coord.)
- FOGARASSY, E (coord.)
- STUKE, M (coord.)
ISBN: 0-444-88947-7
Ano de publicación: 1990
Volume: 18
Páxinas: 206-209
Congreso: SYMP AT THE 1990 SPRING CONF OF THE EUROPEAN MATERIALS RESEARCH SOC : SURFACE PROCESSING AND LASER ASSISTED CHEMISTRY
Tipo: Achega congreso