2010

1. Numerical analysis of temperature profile and thermal-stress during excimer laser induced heteroepitaxial growth of patterned amorphous silicon and germanium bi-layers deposited on Si(100)

   Thin Solid Films, Vol. 518, Núm. 9, pp. 2431-2436

2. Numerical studies of temperature profile and hydrodynamic phenomena during excimer laser assisted heteroepitaxial growth of patterned silicon and germanium bi-layers

   Thin Solid Films, Vol. 518, Núm. 6 SUPPL. 1