Centro
Escola de Enxeñaría Industrial
Publicacións (13) Publicacións nas que participase algún/ha investigador/a
1993
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"Medida directa de la fase en un interferómetro Fizeau mediante la traslación de una red Ronchi"
Óptica pura y aplicada, Vol. 26, Núm. 2, pp. 309-322
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Effects of r.f. power on optical and electrical properties of plasma-deposited hydrogenated amorphous silicon thin films
Sensors and Actuators: A. Physical, Vol. 37-38, Núm. C, pp. 733-736
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Frequency and Time Resolved Measurements at Rotating Ring-Disk Electrodes for Studying Localized Corrosion
Journal of the Electrochemical Society, Vol. 140, Núm. 7, pp. 1955-1961
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ICCD speckle observations of binary stars. VIII. Measurements during 1989-1991 from the Cerro Tololo 4 m telescope
Astronomical Journal, Vol. 106, Núm. 1, pp. 352-360
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IR and XRD study of the tribochemical reactions of copper sulfate with alkali halides
Journal of Solid State Chemistry, Vol. 107, Núm. 2, pp. 314-318
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Intergranular corrosion susceptibility of austenitic–ferritic duplex stainless steels: Application of potentiokinetic reactivation tests
Materials Science and Technology (United Kingdom), Vol. 9, Núm. 2, pp. 163-171
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MICROMETER MEASUREMENTS OF VISUAL DOUBLE STARS MADE AT THE SPANISH OBSERVATORIES AT CALAR-ALTO AND FABRA
ASTRONOMY & ASTROPHYSICS SUPPLEMENT SERIES, Vol. 100, Núm. 3, pp. 641-646
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Modifications of toeplitz matrices: Jump functions
Rocky Mountain Journal of Mathematics, Vol. 23, Núm. 2, pp. 521-531
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Multivariate statistical analysis of precipitation chemistry in northwestern Spain
Water, Air, & Soil Pollution, Vol. 69, Núm. 1-2, pp. 37-55
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Study of the gas-phase parameters affecting the silicon-oxide film deposition induced by an ArF laser
Applied Physics A Solids and Surfaces, Vol. 57, Núm. 2, pp. 181-185
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The effect of coating density on the strain tolerance of corrosion resistant amorphous silica
Surface and Coatings Technology, Vol. 56, Núm. 3, pp. 267-272
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The role of silane and N2O in the CO2 laser-CVD of silicon oxide films
Applied Surface Science, Vol. 69, Núm. 1-4, pp. 281-284
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The role of the buffer gas in the ArF laser chemical vapour deposition of silicon oxide
Thin Solid Films, Vol. 230, Núm. 1, pp. 35-38