Gas mixture dependence of the LCVD of SiO2 films using an ArF laser

  1. Szörényi, T.
  2. González, P.
  3. Fernández, D.
  4. Pou, J.
  5. León, B.
  6. Pérez-Amor, M.
Journal:
Applied Surface Science

ISSN: 0169-4332

Year of publication: 1990

Volume: 46

Issue: 1-4

Pages: 206-209

Type: Article

DOI: 10.1016/0169-4332(90)90143-N GOOGLE SCHOLAR
Data source: Scopus