Hydrogen incorporation in silicon oxide films deposited by ArF laser-induced chemical vapor deposition

  1. Parada, E.G.
  2. González, P.
  3. Serra, J.
  4. León, B.
  5. Pérez-Amor, M.
  6. da Silva, M.F.
  7. Wolters, H.
  8. Soares, J.C.
Revue:
Journal of Non-Crystalline Solids

ISSN: 0022-3093

Année de publication: 1995

Volumen: 187

Pages: 75-80

Type: Article

DOI: 10.1016/0022-3093(95)00115-8 GOOGLE SCHOLAR