Silica deposition by excimer-laser-induced chemical vapour deposition in perpendicular configuration

  1. León, B.
  2. Klumpp, A.
  3. González, P.
  4. Parada, E.G.
  5. Fernández, D.
  6. Pou, J.
  7. Serra, J.
  8. Sigmund, H.
  9. Pérez-Amor, M.
Revue:
Advanced Materials for Optics and Electronics

ISSN: 1057-9257

Année de publication: 1996

Volumen: 6

Número: 2

Pages: 83-92

Type: Article

DOI: 10.1002/(SICI)1099-0712(199603)6:2<83::AID-AMO225>3.3.CO;2-G GOOGLE SCHOLAR
La source de données: Scopus