Analysis of excimer laser annealing of amorphous SiGe on La 2 O 3 //Si structures

  1. Fornarini, L.
  2. Conde, J.C.
  3. S.Chiussi, null
  4. Gonzalez, P.
  5. Leon, B.
  6. Martelli, S.
Journal:
Applied Surface Science

ISSN: 0169-4332

Year of publication: 2007

Volume: 253

Issue: 19

Pages: 7957-7963

Type: Article

DOI: 10.1016/J.APSUSC.2007.02.063 GOOGLE SCHOLAR
Data source: Scopus