A growth rate, structure and surface morphology study of Si1-x-yGexCy films deposited by ArF-LCVD in tilted geometry

  1. López, E.
  2. Chiussi, S.
  3. Kosch, U.
  4. González, P.
  5. Serra, J.
  6. Serra, C.
  7. León, B.
Journal:
Vacuum

ISSN: 0042-207X

Year of publication: 2008

Volume: 82

Issue: 12

Pages: 1525-1528

Type: Article

DOI: 10.1016/J.VACUUM.2008.03.018 GOOGLE SCHOLAR
Data source: Scopus