A growth rate, structure and surface morphology study of Si1-x-yGexCy films deposited by ArF-LCVD in tilted geometry

  1. López, E.
  2. Chiussi, S.
  3. Kosch, U.
  4. González, P.
  5. Serra, J.
  6. Serra, C.
  7. León, B.
Aldizkaria:
Vacuum

ISSN: 0042-207X

Argitalpen urtea: 2008

Alea: 82

Zenbakia: 12

Orrialdeak: 1525-1528

Mota: Artikulua

DOI: 10.1016/J.VACUUM.2008.03.018 GOOGLE SCHOLAR
Datuen iturria: Scopus