193 nm Excimer laser processing of Si/Ge/Si(100) micropatterns
- Gontad, F.
- Conde, J.C.
- Chiussi, S.
- Serra, C.
- González, P.
Revue:
Applied Surface Science
ISSN: 0169-4332
Année de publication: 2016
Volumen: 362
Pages: 217-220
Type: Article