ArF laser CVD of hydrogenated amorphous silicon: The role of buffer gases

  1. Dietrich, T.R.
  2. Chiussi, S.
  3. Stafast, H.
  4. Comes, F.J.
Journal:
Applied Physics A Solids and Surfaces

ISSN: 0721-7250,  1432-0630

Year of publication: 1989

Volume: 48

Issue: 5

Pages: 405-414

Type: Article

DOI: 10.1007/BF00619710 GOOGLE SCHOLAR

Sustainable development goals

Data source: Scopus