ArF laser CVD of hydrogenated amorphous silicon: The role of buffer gases
- Dietrich, T.R.
- Chiussi, S.
- Stafast, H.
- Comes, F.J.
ISSN: 0721-7250, 1432-0630
Année de publication: 1989
Volumen: 48
Número: 5
Pages: 405-414
Type: Article
Revue:
Applied Physics A Solids and Surfaces