Study of the gas-phase parameters affecting the silicon-oxide film deposition induced by an ArF laser

  1. González, P.
  2. Fernández, D.
  3. Pou, J.
  4. García, E.
  5. Serra, J.
  6. León, B.
  7. Pérez-Amor, M.
  8. Szörényi, T.
Journal:
Applied Physics A Solids and Surfaces

ISSN: 0721-7250,  1432-0630

Year of publication: 1993

Volume: 57

Issue: 2

Pages: 181-185

Type: Article

DOI: 10.1007/BF00331442 GOOGLE SCHOLAR
Data source: Scopus