Study of the gas-phase parameters affecting the silicon-oxide film deposition induced by an ArF laser

  1. González, P.
  2. Fernández, D.
  3. Pou, J.
  4. García, E.
  5. Serra, J.
  6. León, B.
  7. Pérez-Amor, M.
  8. Szörényi, T.
Aldizkaria:
Applied Physics A Solids and Surfaces

ISSN: 0721-7250 1432-0630

Argitalpen urtea: 1993

Alea: 57

Zenbakia: 2

Orrialdeak: 181-185

Mota: Artikulua

DOI: 10.1007/BF00331442 GOOGLE SCHOLAR