The role of the buffer gas in the ArF laser chemical vapour deposition of silicon oxide

  1. González, P.
  2. Pou, J.
  3. Fernández, D.
  4. García, E.
  5. Serra, J.
  6. León, B.
  7. Pérez-Amor, M.
Journal:
Thin Solid Films

ISSN: 0040-6090

Year of publication: 1993

Volume: 230

Issue: 1

Pages: 35-38

Type: Article

DOI: 10.1016/0040-6090(93)90343-N GOOGLE SCHOLAR
Data source: Scopus