The role of the buffer gas in the ArF laser chemical vapour deposition of silicon oxide

  1. González, P.
  2. Pou, J.
  3. Fernández, D.
  4. García, E.
  5. Serra, J.
  6. León, B.
  7. Pérez-Amor, M.
Revue:
Thin Solid Films

ISSN: 0040-6090

Année de publication: 1993

Volumen: 230

Número: 1

Pages: 35-38

Type: Article

DOI: 10.1016/0040-6090(93)90343-N GOOGLE SCHOLAR
La source de données: Scopus