Role of silylene in the deposition of hydrogenated amorphous silicon

  1. Dietrich, T.R.
  2. Chiussi, S.
  3. Marek, M.
  4. Roth, A.
  5. Comes, F.J.
Revue:
Journal of Physical Chemistry

ISSN: 0022-3654

Année de publication: 1991

Volumen: 95

Número: 23

Pages: 9302-9310

Type: Article

DOI: 10.1021/J100176A050 GOOGLE SCHOLAR
La source de données: Scopus