Crystallisation of 500nm thick A-SiGe:H films through ArF-Excimer Laser radiation

  1. Chiussi, S.
  2. Fabbri, F.
  3. Fornarini, L.
  4. González, P.
  5. León, B.
  6. Martelli, S.
  7. López, E.
  8. Serra, C.
  9. Serra, J.
Proceedings:
Proceedings of SPIE - The International Society for Optical Engineering

ISSN: 0277-786X

Year of publication: 2003

Volume: 5147

Pages: 204-211

Type: Conference paper

DOI: 10.1117/12.537582 GOOGLE SCHOLAR
Data source: Scopus