Publicacións nas que colabora con Francisco Javier Redondas Maseda (9)

1999

  1. Silicon-carbon thin films deposited by excimer lamp-CVD from disilane and ethylene

    Vacuum, Vol. 52, Núm. 1-2, pp. 51-54

1998

  1. Comparison of modifications induced by ArF excimer laser irradiation on silicon nitride films deposited by different LCVD methods

    Surface and Coatings Technology, Vol. 100-101, Núm. 1-3, pp. 393-397

  2. Dependence on the C2H4 and SiH4 gas mixture of the Si-C film properties obtained by excimer lamp chemical vapour deposition

    Surface and Coatings Technology, Vol. 100-101, Núm. 1-3, pp. 160-163

  3. Growth and characterization of carbon nitride thin films prepared by laser ablation

    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 136-138, pp. 236-240

  4. Influence of the substrate temperature on silicon-carbon thin films deposited from SiH4 and C2H4 by excimer lamp-CVD

    Thin Solid Films, Vol. 317, Núm. 1-2, pp. 112-115

  5. Modification of silicon-carbon film properties under high energy ion beam irradiation

    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 136-138, pp. 511-515

  6. Structural and compositional studies of a-Si,C:H thin films obtained by excimer lamp chemical vapor deposition from acetylene and silane

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 16, Núm. 2, pp. 660-665

1997

  1. Carbon nitride films prepared by excimer laser ablation

    Applied Surface Science, Vol. 109-110, pp. 380-383

1996

  1. Photochemical vapour deposition of hydrogenated amorphous silicon-carbon thin films by using a Xe 2 * excimer lamp

    Applied Surface Science, Vol. 106, pp. 55-59