Influence of the substrate temperature on the structure of Ge containing thin films produced by ArF laser induced chemical vapour deposition

  1. López, E.
  2. Chiussi, S.
  3. González, P.
  4. Serra, J.
  5. León, B.
Revue:
Applied Surface Science

ISSN: 0169-4332

Année de publication: 2005

Volumen: 248

Número: 1-4

Pages: 108-112

Type: Communication dans un congrès

DOI: 10.1016/J.APSUSC.2005.03.091 GOOGLE SCHOLAR
La source de données: Scopus