Study of dopant activation in biaxially compressively strained SiGe layers using excimer laser annealing

1. Luong, G.V.
2. Wirths, S.
3. Stefanov, S.
4. Holländer, B.
5. Schubert, J.
6. Conde, J.C.
7. Stoica, T.
8. Breuer, U.
9. Chiussi, S.
10. Goryll, M.
11. Buca, D.
12. Mantl, S.