Dopant profile engineering using ArF excimer laser, flash lamp and spike annealing for junction formation

  1. Scheit, A.
  2. Lenke, T.
  3. Bolze, D.
  4. Chiussi, S.
  5. Stefanov, S.
  6. Gonzalez, P.
  7. Schumann, T.
  8. Skorupa, W.
Proceedings:
Proceedings of the International Conference on Ion Implantation Technology

ISBN: 978-1-4799-5212-0

Year of publication: 2014

Type: Conference paper

DOI: 10.1109/IIT.2014.6940000 GOOGLE SCHOLAR
Data source: Scopus