Dopant profile engineering using ArF excimer laser, flash lamp and spike annealing for junction formation

  1. Scheit, A.
  2. Lenke, T.
  3. Bolze, D.
  4. Chiussi, S.
  5. Stefanov, S.
  6. Gonzalez, P.
  7. Schumann, T.
  8. Skorupa, W.
Aktak:
Proceedings of the International Conference on Ion Implantation Technology

ISBN: 978-1-4799-5212-0

Argitalpen urtea: 2014

Mota: Biltzar ekarpena

DOI: 10.1109/IIT.2014.6940000 GOOGLE SCHOLAR