Dopant profile engineering using ArF excimer laser, flash lamp and spike annealing for junction formation

  1. Scheit, A.
  2. Lenke, T.
  3. Bolze, D.
  4. Chiussi, S.
  5. Stefanov, S.
  6. Gonzalez, P.
  7. Schumann, T.
  8. Skorupa, W.
Actas:
Proceedings of the International Conference on Ion Implantation Technology

ISBN: 978-1-4799-5212-0

Ano de publicación: 2014

Tipo: Achega congreso

DOI: 10.1109/IIT.2014.6940000 GOOGLE SCHOLAR