Publicacións nas que colabora con JULIA ASUNCION SERRA RODRIGUEZ (17)

2009

  1. Characterization of thin calcium phosphate coating

    Thin Calcium Phosphate Coatings for Medical Implants (Springer New York), pp. 25-66

1997

  1. Carbon nitride films prepared by excimer laser ablation

    Applied Surface Science, Vol. 109-110, pp. 380-383

1996

  1. Aging of photochemical vapor deposited silicon oxide thin films

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 14, Núm. 2, pp. 436-440

  2. Modification of silicon nitride films to oxynitrides by ArF excimer laser irradiation

    Surface and Coatings Technology, Vol. 80, Núm. 1-2, pp. 211-215

  3. Silica deposition by excimer-laser-induced chemical vapour deposition in perpendicular configuration

    Advanced Materials for Optics and Electronics, Vol. 6, Núm. 2, pp. 83-92

  4. Silica deposition by excimer-laser-induced chemical vapour deposition in perpendicular configuration

    Advanced Materials for Optics and Electronics, Vol. 6, Núm. 2, pp. 83-92

1995

  1. Deposition of amorphous silicon nitride thin films by CO2 laser-induced chemical vapour deposition

    Journal of Non-Crystalline Solids, Vol. 187, pp. 353-360

1994

  1. CO2 laser chemical vapor deposition of silica films in a parallel configuration: A study of gas phase phenomena

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 12, Núm. 2, pp. 484-493

  2. Ceramic coating for high-temperature corrosion protection by laser-CVD processes

    Applied Surface Science, Vol. 79-80, Núm. C, pp. 338-343

  3. HIGH TEMPERATURE CORROSION PERFORMANCE OF A-SI/SIO2 DUPLEX COATINGS PRODUCED BY ARF EXCIMER LASER CVD

    ADVANCED MATERIALS '93, I - A & B

  4. High-temperature corrosion-resistant ceramic coatings obtained by laser chemical vapour deposition

    Vacuum, Vol. 45, Núm. 10-11, pp. 1035-1037

  5. Silicon oxide thin films grown by Xe2* excimer lamp chemical vapour deposition: the role of the substrate temperature and the window-substrate distance

    Thin Solid Films, Vol. 241, Núm. 1-2, pp. 348-351

  6. Tailoring silicon oxide film properties by tuning the laser beam-to-substrate distance in ArF laser-induced chemical vapor deposition

    Thin Solid Films, Vol. 241, Núm. 1-2, pp. 80-83

1993

  1. Study of the gas-phase parameters affecting the silicon-oxide film deposition induced by an ArF laser

    Applied Physics A Solids and Surfaces, Vol. 57, Núm. 2, pp. 181-185

  2. The role of silane and N2O in the CO2 laser-CVD of silicon oxide films

    Applied Surface Science, Vol. 69, Núm. 1-4, pp. 281-284

  3. The role of the buffer gas in the ArF laser chemical vapour deposition of silicon oxide

    Thin Solid Films, Vol. 230, Núm. 1, pp. 35-38

1992

  1. Photo-induced chemical vapour deposition of silicon oxide thin films

    Thin Solid Films, Vol. 218, Núm. 1-2, pp. 170-181