Publications by the researcher in collaboration with JUAN MARIA POU SARACHO (17)

2009

  1. Characterization of thin calcium phosphate coating

    Thin Calcium Phosphate Coatings for Medical Implants (Springer New York), pp. 25-66

1997

  1. Carbon nitride films prepared by excimer laser ablation

    Applied Surface Science, Vol. 109-110, pp. 380-383

1996

  1. Aging of photochemical vapor deposited silicon oxide thin films

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 14, Núm. 2, pp. 436-440

  2. Modification of silicon nitride films to oxynitrides by ArF excimer laser irradiation

    Surface and Coatings Technology, Vol. 80, Núm. 1-2, pp. 211-215

  3. Silica deposition by excimer-laser-induced chemical vapour deposition in perpendicular configuration

    Advanced Materials for Optics and Electronics, Vol. 6, Núm. 2, pp. 83-92

  4. Silica deposition by excimer-laser-induced chemical vapour deposition in perpendicular configuration

    Advanced Materials for Optics and Electronics, Vol. 6, Núm. 2, pp. 83-92

1995

  1. Deposition of amorphous silicon nitride thin films by CO2 laser-induced chemical vapour deposition

    Journal of Non-Crystalline Solids, Vol. 187, pp. 353-360

1994

  1. CO2 laser chemical vapor deposition of silica films in a parallel configuration: A study of gas phase phenomena

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 12, Núm. 2, pp. 484-493

  2. Ceramic coating for high-temperature corrosion protection by laser-CVD processes

    Applied Surface Science, Vol. 79-80, Núm. C, pp. 338-343

  3. HIGH TEMPERATURE CORROSION PERFORMANCE OF A-SI/SIO2 DUPLEX COATINGS PRODUCED BY ARF EXCIMER LASER CVD

    ADVANCED MATERIALS '93, I - A & B

  4. High-temperature corrosion-resistant ceramic coatings obtained by laser chemical vapour deposition

    Vacuum, Vol. 45, Núm. 10-11, pp. 1035-1037

  5. Silicon oxide thin films grown by Xe2* excimer lamp chemical vapour deposition: the role of the substrate temperature and the window-substrate distance

    Thin Solid Films, Vol. 241, Núm. 1-2, pp. 348-351

  6. Tailoring silicon oxide film properties by tuning the laser beam-to-substrate distance in ArF laser-induced chemical vapor deposition

    Thin Solid Films, Vol. 241, Núm. 1-2, pp. 80-83

1993

  1. Study of the gas-phase parameters affecting the silicon-oxide film deposition induced by an ArF laser

    Applied Physics A Solids and Surfaces, Vol. 57, Núm. 2, pp. 181-185

  2. The role of silane and N2O in the CO2 laser-CVD of silicon oxide films

    Applied Surface Science, Vol. 69, Núm. 1-4, pp. 281-284

  3. The role of the buffer gas in the ArF laser chemical vapour deposition of silicon oxide

    Thin Solid Films, Vol. 230, Núm. 1, pp. 35-38

1992

  1. Photo-induced chemical vapour deposition of silicon oxide thin films

    Thin Solid Films, Vol. 218, Núm. 1-2, pp. 170-181